Abstract
Electron microscopy is a powerful tool for characterizing nanomaterials at the atomic scale. However, small nanoclusters are particularly susceptible to electron beam activation due to their high surface-to-volume ratio and sensitivity to energetic electrons1. The interaction between the electron beam and nanoclusters can induce mobility and structural changes2, compromising the accuracy of dynamic in situ studies.
Here, we aim to quantitatively analyze the electron beam-induced restructuring of small nanoclusters and develop strategies to mitigate this effect by investigating different experimental parameters such as beam energy, sample environment, and low-dose imaging techniques. Implementing these advanced imaging and analysis techniques will help us understand the electron beam effect on the clusters and study their dynamics under controlled in situ conditions.
In addition, we propose to delve deeper into the behavior of nanoparticles on solid surfaces under applied electric fields through in situ biasing experiments. Understanding how nanoparticles respond to electric fields on a solid substrate is crucial for various applications, including catalysis, sensing, and nanoelectronics3. By applying controlled electric fields during electron microscopy imaging, we can explore the dynamics of nanoparticle assembly and reconfiguration under external stimuli. Furthermore, to facilitate comprehensive 3D investigations of these assemblies, we plan to develop a novel tomography biasing chip that enables us to probe the three-dimensional architecture of nanoparticle assemblies in real-time, providing valuable insights into their structural evolution and response to external stimuli.
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