Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling

Source
Plasma sources science and technology - ISSN 0963-0252-32:6 (2023) p. 1-23
Author(s)

Multiscale modeling of plasma–surface interaction : general picture and a case study of Si and SiO₂ etching by fluorocarbon-based plasmas

Source
Applied physics reviews - ISSN 1931-9401-8:4 (2021) p.
Author(s)

The essential role of the plasma sheath in plasma–liquid interaction and its applications : a perspective

Source
Journal of applied physics - ISSN 0021-8979-129:22 (2021) p.

Laser-induced excitation mechanisms and phase transitions in spectrochemical analysis : review of the fundamentals

Source
Spectrochimica acta: part B : atomic spectroscopy - ISSN 0584-8547-179 (2021) p.