Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling

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Plasma sources science and technology - ISSN 0963-0252-32:6 (2023) p. 1-23
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Multiscale modeling of plasma–surface interaction : general picture and a case study of Si and SiO₂ etching by fluorocarbon-based plasmas

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Applied physics reviews - ISSN 1931-9401-8:4 (2021) p.
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The essential role of the plasma sheath in plasma–liquid interaction and its applications : a perspective

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Journal of applied physics - ISSN 0021-8979-129:22 (2021) p.

Laser-induced excitation mechanisms and phase transitions in spectrochemical analysis : review of the fundamentals

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Spectrochimica acta: part B : atomic spectroscopy - ISSN 0584-8547-179 (2021) p.